Semiconductor device for testing characteristics of transistors and method for testing semiconductor device

ABSTRACT

A semiconductor device for evaluating characteristics of a transistor is provided. The semiconductor device includes a substrate, an active area defined on the substrate, an insulated gate configured to be formed on the active area, a first source layer and a first drain layer configured to be formed on the active area in a first two-way direction of the gate, and a second source layer and a second drain layer configured to be formed on the active area in a second two-way direction of the gate. The first source layer, the first drain layer, and the second drain layer are formed as a first conductive type. The second source layer is formed as a second conductive type.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims priority under 35 U.S.C. § 119 to Korean PatentApplication No. 10-2017-0161803 filed on Nov. 29, 2017 and No.10-2018-0006979 filed on Jan. 19, 2018, in the Korean IntellectualProperty Office, the disclosures of which are incorporated by referenceherein in their entireties.

BACKGROUND

Embodiments of the inventive concept described herein relate tosemiconductor devices, and more particularly, relate to methods fortesting characteristics of semiconductor devices.

Today, semiconductor technology is used as wide as it is applied toalmost all of things around us. There is a metal oxide semiconductorfield effect transistor (MOSFET) which is the most frequently useddevice among a large number of semiconductor transistors. However, powerconsumption increases greatly as semiconductor integration according toMoore's Law increases and as an operating speed is enhanced, so MOSFETdevices have reached the limit of being used as low-power devices.Research has been conducted in a tunneling field effect transistor(TFET) using band-to-band tunneling as an alternative to the MOSFET. TheMOSFET operates on the principle where carriers receive energy greaterthan or equal to an energy barrier and crosses the barrier, whereas theTFET operates on the principle where electrons tunnel from a valenceband to a conduction band such that current flows. In other words, theTFET is advantageous to reduce a standby current as much as usingtunneling. However, reliability evaluation should be preceded prior tousing the TFET. The reliability is defined as an evaluation index whichrepresents how long products or components are used safely andconveniently without failure while consumers use the products orcomponents as a quantitative measure. It is required to accuratelyevaluate and analyze reliability characteristics. Thus, when a TFET isused, reliability evaluation is required in advance.

SUMMARY

Embodiments of the inventive concept provide a device which may be usedas a tunneling field effect transistor (TFET) or a metal oxidesemiconductor field effect transistor (MOSFET) depending on a voltageapplying scheme.

Embodiments of the inventive concept provide a device for applyingintentional stress to a semiconductor device, evaluating detailedcharacteristics and reliability of a TFET, and analyzing performance ofthe TFET.

According to an exemplary embodiment, a semiconductor device may includea first transistor configured to be driven in a first mode and a secondtransistor configured to be driven in a second mode different from thefirst mode. The first transistor and the second transistor may share thesame channel layer.

According to an exemplary embodiment, a semiconductor device may includea substrate, an active area defined on the substrate, an insulated gateconfigured to be formed on the active area, a first source layer and afirst drain layer configured to be formed on the active area in a firsttwo-way direction of the gate, and a second source layer and a seconddrain layer configured to be formed on the active area in a secondtwo-way direction of the gate. Each of the first source layer, the firstdrain layer, and the second drain layer may be formed as a firstconductive type. The second source layer may be formed as a secondconductive type.

The semiconductor device may further include a first source electrode, afirst drain electrode, a second source electrode, and a second drainelectrode configured to be electrically connected with the first sourcelayer, the first drain layer, the second source layer, and the seconddrain layer, respectively.

Each of the first source electrode, the first drain electrode, thesecond source electrode, and the second drain electrode may include afirst electrode member configured to be electrically connected with acorresponding source layer and drain layer formed on the active area andbe extended horizontally outward from the semiconductor device, a firstelectrode pad configured to be formed on a location which is notadjacent to the first electrode member, and a second electrode memberconfigured to be electrically connected with one end of the firstelectrode member and one end of the first electrode pad and have a widthnarrower than the first electrode member and the first electrode pad.

The insulated gate may be formed larger in width than the active areawhere the first source layer, the first drain layer, the second sourcelayer, and the second drain layer are formed.

The semiconductor device may further include a controller configured tohave a first mode for forming a first channel between the first sourcelayer and the first drain layer in the active area and have a secondmode for forming a second channel between the second source layer andthe second drain layer in the active area. The first channel and thesecond channel may be selectively formed.

According to an exemplary embodiment, a method for testing asemiconductor device may include verifying whether the semiconductordevice is driven, applying stimulation for forming stress on a surfacebetween at least one of a first source layer, a first drain layer, asecond source layer, and a second drain layer and a gate insulatinglayer to the semiconductor device, and evaluating performance of atunneling field effect transistor (TFET), after the stress is formed onthe surface.

The applying of the stimulation to the semiconductor device may includeat least one of applying voltage for degrading the surface to a gatelayer and heating the semiconductor device at a temperature fordegrading the surface.

The evaluating of the performance of the tunneling field effecttransistor (TFET) may be performed using a manner to evaluateperformance of a metal oxide semiconductor field effect transistor(MOSFET).

According to an exemplary embodiment, a semiconductor test pattern mayinclude a substrate, an active area of a cross form, the active areabeing defined on the substrate, a gate configured to be located on acentral portion of the active area, a gate insulating film configured tobe located between the gate and the central portion of the active area,and four impurity regions formed on the active area outside the gate.Any one of the four impurity regions may be formed as a first conductivetype. Each of the other impurity regions may be formed as a secondconductive type.

The gate may be formed larger in width than the active area where theimpurity are formed.

BRIEF DESCRIPTION OF THE FIGURES

The above and other objects and features will become apparent from thefollowing description with reference to the following figures, whereinlike reference numerals refer to like parts throughout the variousfigures unless otherwise specified, and wherein:

FIG. 1 is a plan view illustrating an embodiment of a semiconductordevice sharing a channel layer in the inventive concept;

FIGS. 2A and 2B are cross-sectional views of a semiconductor device ofFIG. 1, taken along axes 1A-1B and 1C-1D;

FIG. 3 is a perspective view illustrating a semiconductor deviceaccording to an embodiment of the inventive concept;

FIG. 4 is a view illustrating a semiconductor device having gates withvarious horizontal-to-vertical ratios according to another embodiment ofthe inventive concept;

FIG. 5 is a plan view illustrating an embodiment for connectingelectrodes to a semiconductor device according to the inventive concept;

FIG. 6 is a perspective view illustrating a semiconductor deviceaccording to an embodiment of FIG. 5;

FIG. 7 is a cross-sectional view of a semiconductor device according toan embodiment of FIG. 5, taken along axis 5A-5B;

FIG. 8 is a cross-sectional view illustrating an embodiment forconnecting electrodes to a semiconductor device according to theinventive concept in another manner; and

FIG. 9 is a flowchart illustrating a method for testing a semiconductordevice according to an embodiment of the inventive concept.

DETAILED DESCRIPTION

Hereinafter, embodiments of the inventive concept are described forclarity and in detail so that this disclosure will be thorough andcomplete and will fully convey the scope of the inventive concept tothose skilled in the art. However, the inventive concept is not limitedby embodiments disclosed hereinafter, and may be implemented in variousforms. Furthermore, in describing an exemplary embodiment of theinventive concept in detail, when it is determined that a detaileddescription of related well-known functions or components unnecessarilyblurs the gist of the inventive concept, the detailed description willbe omitted. Furthermore, the same reference numerals and denotations areused for portions for performing similar functions and operationsthroughout the accompanying drawings.

In addition, throughout the specification, when an element is referredto as being “connected” to another element, the element may be “directlyconnected” to the other element with one or more intervening elementsinterposed in between.

Unless explicitly described to the contrary, the expression “comprisingany element” will be understood to imply the further inclusion of otherelements but not the execution of the other elements. In detail, itshould be understood that the terms “comprises,” “comprising,”“includes,” “including,” “have,” or “having” when used in thisspecification, specify the presence of features, integers, steps,operations, elements, or components stated on the specification, but donot preclude the presence or addition of one or more other features,integers, steps, operations, elements, components, and/or groupsthereof.

Although the terms “first” and “second” may be used herein to describevarious elements, these elements should not be limited by these terms.These terms are only used to distinguish one element from the other. Forexample, a first element may be named a second element without departingfrom the scope and sprit of the inventive concept. Likewise, a secondelement may be named a first element.

The singular expression may include plural expressions unless otherwisespecified. Furthermore, in the drawings, the shapes and sizes ofelements may be exaggerated for clarity.

The term “unit” used throughout the specification may refer to a unit ofprocessing at least one function or operation. For example, the term“unit” used herein may refer to software or a hardware element such as afield programmable gate array (FPGA) or an application specificintegrated circuit (ASIC). However, it does not mean that the term“unit” used herein is limited to software or hardware. The term “unit”used herein may be constituted to exist in an addressing-possiblestorage medium, or may be constituted to regenerate one or moreprocessors.

As an example, the term “unit” used herein may include elements, such assoftware elements, object-oriented software elements, class elements,and task elements, processes, functions, attributes, procedures,sub-routines, segments of a program code, drivers, firmware, amicrocode, a circuit, data, a database, data structures, tables, arrays,and variables. Elements and functions provided in “unit” may beseparated and performed by a plurality of elements and “units”, or maybe integrated with other additional elements.

The inventive concept relates to a semiconductor device, and moreparticularly, relates to a semiconductor device which hasproblem-solving principles of sharing a channel of a transistor drivenin a second mode different from a first mode with a transistor driven inthe first mode. The semiconductor device may operate as the transistordriven in the first mode and the transistor driven in the second mode inone device, respectively, using structural characteristics in which achannel region of the transistors is shared. Furthermore, a manner toevaluate characteristics of the transistor driven in the first mode maybe used to evaluate characteristics of the transistor driven in thesecond mode. The problem-solving principles of the semiconductor devicesharing a channel according to an embodiment of the inventive conceptmay also be applied when there are a plurality of source layers anddrain layers facing each other. Moreover, the problem-solving principlesof the semiconductor device may also be applied when the shared channelregion is formed at several angles, other than when it should bevertically formed.

Hereinafter, a description will be given of an exemplary embodiment ofthe inventive concept.

In FIG. 1, a plan view of a semiconductor device 300 according to anembodiment of the inventive concept is illustrated. Referring to FIG. 1,the semiconductor device 300 according to an embodiment of the inventiveconcept may include a substrate 30, an active area 40 defined on thesubstrate 30 and a gate 10 formed on the active area 40, and a firstsource layer S1 and a first drain layer D1 formed on the active area 40in a first two-way direction of the gate 10. The semiconductor device300 may further include a second source layer S2 and a second drainlayer D2 formed on the active area 40 in a second two-way direction ofthe gate 10. The semiconductor device 300 may have a feature whichshares a channel layer between the first source layer S1 and the firstdrain layer D1 and a channel layer between the second source layer S2and the second drain layer D2. The first two-way direction of the gate10 may be an x-axis direction. The second two-way direction of the gate10 may be a direction orthogonal to the first two-way direction, thatis, a y-axis direction. The active area 40 may be formed in the form ofa cross. The first source layer S1, the first drain layer D1, or thesecond drain layer D2 may be formed as a first conductive type, and thesecond source layer S2 may be formed as a second conductive layer.

FIGS. 2A and 2B are cross-sectional views of a semiconductor device ofFIG. 1, taken along axes 1A-1B and 1C-1D. A description will be given ofa cross-sectional view of the semiconductor device, taken along axis1A-1B, and a cross-sectional view of the semiconductor device, takenalong axis 1C-1D, with reference to FIGS. 2A and 2B.

Referring to FIG. 2A, a semiconductor device 300 of FIG. 1 may include afirst source layer S1 formed as n-type and a first drain layer D1 formedas n-type. The semiconductor device 300 may further include aninsulating film 20 and a gate 10 which are formed to cover a part of anactive area 40 on which the first source layer S1 and the first drainlayer D1 are formed. When a gate voltage is applied to the gate 10 via agate electrode and when a proper voltage is applied to the first sourcelayer S1 and the first drain layer D1, a channel layer may be formed inthe active area 40 below the insulating film 20 between the first sourcelayer S1 and the first drain layer D1 such that current flow. In otherwords, the semiconductor device 300 of FIG. 2A may be driven as a metaloxide silicon field effect transistor (MOSFET).

Referring to FIG. 2B, the semiconductor device 300 may include a secondsource layer S2 formed as p-type and a second drain layer D2 formed asn-type. The semiconductor device 300 may further include an insulatingfilm 20 and a gate 10 which are formed to cover a part of the activearea 40 on which the second source layer S2 and the second drain layerD2 are formed. When a gate voltage is applied to the gate 10 via a gateelectrode and when a proper voltage is applied to the second sourcelayer S2 and the second drain layer D2 of the semiconductor device 300,a channel layer may be formed in the active area 40 below the insulatingfilm 20 between the second source layer S2 and the second drain layer D2such that electrons move in a tunneling scheme since an energy level ofthe active area 40 is changed, so current may flow. In other words, thesemiconductor device 300 of FIG. 2B may be driven as a tunneling fieldeffect transistor (TFET).

FIG. 3 is a perspective view illustrating a semiconductor deviceaccording to an embodiment of the inventive concept. Referring to FIG.3, a view illustrating a semiconductor device 300 in three dimensions isprovided. To prevent a short circuit, a gate 10 may be formed larger inwidth than an active area. W₁ shown in FIG. 3 denotes the width of thegate 10, and W₂ shown in FIG. 3 denotes the width of the active area. Inother words, a value of W₁ may be larger than a value of W₂. Althoughthe width of the gate 10 is not considered in size, a gate size marginmay be designed to preferably have a value of a minimum of 0.1 um. Inother words, a value of (W₁−W₂)/2 may be a minimum of 0.1 um.

In detail, contrary to a typical transistor, two transistors in thesemiconductor device 300 according to an embodiment of the inventiveconcept may share a channel, and the semiconductor device 300 mayinclude two pairs of impurity regions, a pair of impurity regions ofwhich become a source and a drain. In an ion implantation process whenfabricating a semiconductor device according to an embodiment of theinventive concept, the semiconductor device may have a feature whichshares a gate and a channel layer, so there may be a probability thatimpurities will come into contact with each other when the semiconductordevice is designed too small, or there may be a probability thatdiffusion will occur due to a difference between electron concentrationdistributions. When diffusion occurs, a channel may not be formedproperly, so the semiconductor device may lose its function. Thus, toprevent a short circuit, the gate 10 may be formed large enough so thata MOSFET and a TFET may be driven properly.

A substrate 30 may include any suitable semiconductor material, forexample, silicon (Si), germanium (Ge), silicon germanium (SiGe), indiumarsenide (InAs), germanium tin (GeSn), silicon germanium tin (SiGeSn),or any other III-V or II-VI compound semiconductors.

The substrate 30 may be doped, undoped or contain both doped and undopedregions therein. The substrate 30 may also include one or more doped (n-or p-) regions. When the substrate 30 includes multiple doped regions,these regions may be the same, or they may have different conductivitiesand/or doping concentrations. These doped regions are known as “wells”and may be used to define various device regions.

It is preferable to deposit materials with high permittivity, forexample, aluminum oxide (Al₂O₃) or the like which is metal oxide, in anatomic layer deposition (ALD) technique to form an insulating film 20using a shallow trench isolation (STI) process or a boron phosphorussilicate glass (BPSG) process.

The gate 10 deposited on the insulating film 20 may be preferable to beformed of metal, for example, may be formed by depositing aluminum,titanium, or the like.

In an embodiment, the semiconductor device 300 may be designed invarious styles depending on whether a first source layer S1, a firstdrain layer D1, or a second drain layer D2 is formed as a firstconductive type or a second conductive type. Each of the firstconductive type and the second conductive type may be n-type or p-type.Hereinafter, a description will be in detail.

When a p-region is included in an n-type substrate, when the firstsource layer S1, the first drain layer D1, or the second drain layer D2is formed as n-type, and when the second source layer S2 is formed asp-type, the semiconductor device 300 may be designed as an nMOSFET orpTFET according to a voltage applying scheme. As another example, whenan n-region is included in a p-type substrate, when the first sourcelayer S1, the first drain layer D1, or the second drain layer D2 isformed as p-type, and when the second source layer S2 is formed asn-type, the semiconductor device 300 may be designed as a pMOSFET ornTFET according to the voltage applying scheme.

FIG. 4 is a view illustrating a semiconductor device having gates withvarious horizontal-to-vertical ratios according to another embodiment ofthe inventive concept. A description will be given of another embodimentof a semiconductor device of the inventive concept with reference toFIG. 4. The ratio of a horizontal length to a vertical length of a gateof a MOSFET or a TFET is not a fixed value. Thus, a design is possibleby changing the ratio of the horizontal length to the vertical length toseveral ratios. As shown in FIG. 4, an embodiment is exemplified as theratio of the horizontal length to the vertical length of the gate is theratio of an integer to an integer. However, embodiments are not limitedthereto. For example, the ratio of the horizontal length to the verticallength of the gate is the ratio of a prime number to a prime number. Inother words, a horizontal length of the gate 10 may correspond to alength of a channel formed between a first source layer S1 and a firstdrain layer D1 and a vertical length of the gate 10 may correspond to alength of a channel formed between a second source layer S2 and a seconddrain layer D2, so a length of a channel of a TFET and a MOSFET may beused by changing to various lengths.

In FIG. 5, a plan view of a semiconductor device 300 having 5 electrodesis illustrated. In FIG. 6, a perspective view of the semiconductordevice 300 of FIG. 5 is illustrated. A description will be given of adetailed embodiment of the semiconductor device 300 according to anembodiment of the inventive concept with reference to FIGS. 5 and 6. Asemiconductor device may further include a first source electrode 200, afirst drain electrode 220, a second source electrode 210, and a seconddrain electrode 230 in the semiconductor device 300 of FIG. 1. The firstsource electrode 200, the first drain electrode 220, the second sourceelectrode 210, and the second drain electrode 230 may be electricallyconnected with a first source layer S1, a first drain layer D1, a secondsource layer S2, and a second drain layer D2, respectively.

Each of the first source electrode 200, the first drain electrode 220,the second source electrode 210, and the second drain electrode 230 mayinclude a first electrode member 110, a first electrode pad 130, and asecond electrode member 120. The first electrode member 110 may beelectrically connected with a part of a corresponding source layer or acorresponding drain layer. The first electrode member 110 may be formedin an outward direction of the semiconductor device 300 and may beformed in the direction of being horizontally extended. The firstelectrode pad 130 to which voltage is actually applied may fail to comeinto direct contact with the first electrode member 110. Thesemiconductor device 300 may further include the second electrode member120 which electrically connects the first electrode pad 130 with thefirst electrode member 110.

The second electrode member 120 may physically connect the firstelectrode pad 130 with the first electrode member 110 and may be formedin the direction of being extended outward from the semiconductor device300. Furthermore, the second electrode member 120 may have a widthnarrower than a length of the first electrode pad 130 and the firstelectrode member 110. The second electrode member 120 may connect thefirst electrode pad 130 with the first electrode member 110 using itsnarrow width to prevent a short circuit from occurring between the firstelectrode member 110 and the first electrode pad 130. The secondelectrode member 120 may be formed to be as long as a short circuit doesnot occur between the first electrode member 110 and the first electrodepad 130. Furthermore, the first electrode pad 130 may be laid out to befar apart from the first electrode member 110 to prevent a shortcircuit. Thus, a short circuit problem between a MOSFET and a TFET,which occurs because electrodes are close to each other, are solved, andthere is no concern that the MOSFET and the TFET may be simultaneouslydriven after voltage is simultaneously applied to the MOSFET and thetunneling FET.

FIG. 7 illustrates a cross-sectional view of a semiconductor device ofFIG. 5, taken along axis 5A-5B. An embodiment of a semiconductor device300 illustrates a TFET including an n-type substrate, a p-well, a secondsource layer S2 formed as p-type, and a second drain layer D2 formed asn-type. The TFET may further include an insulating film 20, a gate 10,and a gate electrode 100 and may further include a second sourceelectrode 210 and a second drain electrode 230. Furthermore, a part ofthe second source layer S2 and the second source electrode 210 and apart of the second drain layer D2 and the second drain electrode 230 maybe connected to an STI insulating film 50. The second source electrode210 may include a first electrode member 110, a first electrode pad 130,and a second electrode member 120. The first electrode member 110 may belocated on a top end of the second source layer S2, and the firstelectrode pad 130 and the second electrode member 120 may be located ona top end of the STI insulating film 50.

FIG. 8 is a cross-sectional view illustrating an embodiment forconnecting electrodes to a semiconductor device according to theinventive concept in another manner. A description will be given ofanother embodiment of a semiconductor device with reference to FIG. 8.In FIG. 7, a source electrode and a drain electrode may be configuredhorizontally. However, in FIG. 8, electrodes may be configuredvertically using a back-end process. FIG. 8 is a cross-sectional view ofa TFET vertically configuring array of electrodes in a cross-sectionalview of a semiconductor device of FIG. 5, taken along axis 5A-5B. Afirst electrode member 110 may be formed in a semiconductor device 300of FIG. 1 to be adjacent to a part of a corresponding source layer or acorresponding drain layer. After a BPSG insulating film 60 may be formedto the same height as a gate 10, a first electrode pad 130 to whichvoltage is actually applied may be configured to be located on a planeof the same location as a height where a gate electrode 100 is located.The first electrode pad 130 and the first electrode member 110 may beelectrically connected with each other via a second electrode member 120vertically located. An embodiment of the inventive concept may solve aproblem resulting in relative deterioration in integration by locatingelectrodes to be horizontally wide in FIG. 7.

The semiconductor device 300 according to an embodiment of the inventiveconcept may further include a controller having a first mode for forminga first channel in an active area 40 between a first source layer S1 anda first drain layer D1 and a second mode for forming a second channel inthe active area 40 between a second source layer S2 and a second drainlayer D2. The first mode may be a mode where the semiconductor device300 is driven as a MOSFET, and the second mode may be a mode where thesemiconductor device 300 is driven as a TFET.

The first channel may be a channel generated between the first sourcelayer S1 and the first drain layer D1 such that current flows whenvoltage is applied to a gate electrode of the semiconductor device 300.The second channel may be a channel generated between the second sourcelayer S2 and the second drain layer D2 since an energy level of anactive area is changed, such that electrons move in a tunnelingtechnique when voltage is applied to the gate electrode 100 of thesemiconductor device 300.

The first channel and the second channel may be selectively formed andmay fail to be driven simultaneously. In other words, in an embodiment,referring to FIGS. 1, 2A, and 2B, the semiconductor device 300 may bedriven as the MOSFET of the first mode or the TFET of the second modedepending on a voltage driving scheme. In detail, a pulse voltage may beapplied to the gate 10, and a second source electrode 210 or a seconddrain electrode 230 may float. When voltage is applied to a first sourceelectrode 200 and a first drain electrode 220, the semiconductor device300 may be driven as a MOSFET. In the same principle, a pulse voltagemay be applied to the gate 10, and the first source electrode 200 or thefirst drain electrode 200 may float. When voltage is applied to thesecond source electrode 210 and the second drain electrode 230, thesemiconductor device 300 may be driven as a TFET.

Hereinafter, in another aspect of the inventive concept, a descriptionwill be given of a method for testing a semiconductor device. To enhancea probability that a TFET will be driven, there should be a highprobability that electrons will tunnel from a valence band of a sourceto a conduction band of a drain. In this case, the probability that theelectrons will tunnel may vary with characteristics of a gate oxide andcharacteristics of a surface between the gate oxide and a channel. Thus,an embodiment of the inventive concept may provide a device whichgenerates a defect in the surface by artificially applying electricalstress and analyzes a correlation between surface characteristics andperformance.

Referring to FIG. 9, a method for testing a semiconductor device isschematically illustrated. Hereinafter, a description will be given ofrespective operations with reference to FIG. 9.

An operation which should be preceded in an operation of evaluatingcharacteristics of a semiconductor device 300 of FIG. 1 may be anoperation (S10) of verifying whether the semiconductor device 300 isdriven. It may be verified how long the semiconductor device 300 isstably usable when the semiconductor device 300 is normally operated, soit should be determined whether the semiconductor device 300 is drivenprior to reliability evaluation. The verification whether thesemiconductor device 300 is driven may be performed using a manner toevaluate i-v characteristics. When a MOSFET and a TFET of thesemiconductor device 300 are normally driven in operation S20, a nextoperation may proceed to operation S30. When the semiconductor device300 is not driven normally, the test may be ended.

In next operation S40, a gate 10 of FIG. 1 may be degraded andcharacteristics and reliability of the TFET may be evaluated using amanner to evaluate characteristics of the MOSFET. When a constantvoltage or a constant current is directly applied to a common gateelectrode, a defect may occur in a gate oxide. Such a defect iselectrified, so it may have an influence on driving a device.Deterioration in driving a device may be known by a change in saturationcurrent or threshold voltage, deterioration in gate oxide may be knownby a change in gate leakage current.

A characteristic evaluation test on the market is applied to a MOSFET.The test applied to the MOSFET may be applied to a TFET sharing a gate,so performance of the TFET may be evaluated and a device may beanalyzed.

In an embodiment, the method of degrading the gate 10 of thesemiconductor device 300 may be a method using hot carrier.Alternatively, the method of degrading the gate 10 of the semiconductordevice 300 may be a method of applying high-temperature stimulationusing a bias temperature instability (BTI) method. Alternatively, timedependent dielectric breakdown (TDDB) may also be used as the method ofdegrading the gate 10 of the semiconductor device 300.

In an embodiment, channel hot carrier (CHC) and drain avalanche hotcarrier (DAHC) may be mainly used as the method using the hot carrier.

The CHC may be degradation using electrons captured using a trap in theoxide over the oxide, the electrons having large energy after some ofelectrons passing through a channel by an electric field held on bothends of the channel accelerate without probabilistically colliding witha lattice and may use a condition in which a gate voltage and a drainvoltage are set to be equal to each other. In the DAHC, electrons whichaccelerate by an electric field applied between a drain and a substrateat a drain end and obtains energy may collide with a lattice, so anelectron-hole pair may be generated. When there is maximum impactionization (Vg to Vd/2), the DAHC may represent the highest degradationcharacteristics.

In an embodiment of the inventive concept, when the CHC is used, a gatevoltage for degrading the semiconductor device 300 may be 4.2 V, 4.4 V,or 4.6 V and a drain voltage may be 4.2 V, 4.4 V, or 4.6 V.

In an embodiment of the inventive concept, when the DAHC is used, a gatevoltage for degrading the semiconductor device 300 may be 2 V and adrain voltage may be 4.2 V, 4.4 V, or 4.6 V.

In detail, high energy carrier named hot carrier may be generated by ahigh channel electric field near a drain of a MOSFET device. The hotcarrier may transmit energy to a silicon lattice through phonon emissionand may destroy the coupling in a silicon/silicon oxide surface. Inother words, since the hot carrier is generated by the high channelelectric field near the drain of the MOSFET device, driving a MOSFET ofthe semiconductor device 300 according to an embodiment of the inventiveconcept and generating hot carrier may have an influence on a TFETsharing the gate 10 of the semiconductor device 300. Thus, it is anobject of the inventive concept to evaluate how performance of the TFETinfluenced by such hot carrier is.

A description will be given of another degradation scheme of thesemiconductor device 300 according to an embodiment of the inventiveconcept. An electrochemical reaction which generates degradation of adevice may greatly depend on an electric field perpendicular to the gateand a stress temperature, so negative bias thermal instability (NBTI)evaluation may be executed at a high temperature. In an embodiment ofthe inventive concept, applying an NBTI stress of a pMOSFET may beperformed by grounding a first source electrode 200, a first drainelectrode 220, and a substrate 30 at a high temperature and applying anegative voltage to a gate electrode 100 of the pMOSFET. Performancedegradation by NBTI may generally be measured in a condition wheretemperature is 100 to 300° C. and where a gate oxide electric field isless than or equal to 6 MV/cm. When an NBTI test is in progress, as astress time increases, AVth may increase. This is because a trap occurscontinuously while stress is applied. Furthermore, as a gate voltageincreases, ΔVth may greatly increase. This is because an electric fieldin a vertical direction increases as the gate voltage increases.

In an embodiment of the inventive concept, after degradation proceeds bythe above-mentioned methods, characteristics of current which flowsaccording to a state of the semiconductor device 300, that is, DCcharacteristics of the semiconductor device 300 may be analyzed. In anembodiment of the inventive concept, characteristics of a TFET may beevaluated using a manner to evaluate characteristics of a MOSFET. Themethod of evaluating the characteristics of the MOSFET may be a methodof measuring a threshold voltage. Alternatively, the method ofevaluating the characteristics of the MOSFET may be a method ofmeasuring carrier mobility. Furthermore, the method of evaluating thecharacteristics of the MOSFET may be a method of measuring adirect-current current-voltage (DCIV). In addition, the method ofevaluating the characteristics of the MOSFET may be a method ofmeasuring a gradient value, a leakage current, or the like in athreshold voltage or less.

In a semiconductor device influenced by the hot carrier, a thresholdvoltage may be increased by the hot carrier and transconductance and adrain current may be decreased, thus resulting in reduced deviceperformance. Change rates of the above three variables may be measuredover time when stress is applied, and characteristic evaluation mayproceed using a manner to extract an operating time in an operatingvoltage.

In an embodiment of the inventive concept, a brief description will begiven of only the method of measuring the threshold hold. In the methodof measuring the threshold hold, when a low voltage less than 0.05 V isapplied to a drain, the voltage may be extracted as a Vg value when acurrent of 100 nA per unit um flows in a drain end.

As a result, using an embodiment of the inventive concept, a surface ofthe gate oxide may be degraded through the above-mentioned variety ofelectrical stress, and thus linkage research may proceed.

Furthermore, other next-generation semiconductor devices as well as theTFET according to an embodiment of the inventive concept may evaluatereliability using such technologies.

There may be an effect capable of verifying quality of the oxide of thesemiconductor device 300 according to an embodiment of the inventiveconcept.

According to an embodiment of the inventive concept, a device whichshares a channel of the MOSFET and the TFET may be provided to be usedas the MOSFET or the TFET depending on a voltage control scheme.

According to an embodiment of the inventive concept, characteristics ofthe TFET and the MOSFET may be analyzed under various conditions byadjusting a degradation level of the surface depending on a degree towhich intentional stress is applied.

According to another embodiment of the inventive concept, thereliability of the TFET may be evaluated by applying the manner toevaluate the characteristics of the MOSFET to the TFET. The inventiveconcept may be used to evaluate the reliability of a next-generationsemiconductor device as well as the TFET.

While the inventive concept has been described with reference toexemplary embodiments, it will be apparent to those skilled in the artthat various changes and modifications may be made without departingfrom the spirit and scope of the inventive concept. Therefore, it shouldbe understood that the above embodiments are not limiting, butillustrative.

What is claimed is:
 1. A semiconductor device, comprising: a firsttransistor configured to be driven in a first mode; and a secondtransistor configured to be driven in a second mode different from thefirst mode, wherein the first transistor and the second transistor sharethe same channel layer and the same gate, and wherein the firsttransistor is a tunneling field effect transistor (TFET) and the secondtransistor is a metal oxide semiconductor field effect transistor(MOSFET).
 2. A semiconductor device, comprising: a substrate; an activearea defined on the substrate; an insulated gate configured to be formedon the active area; a first source layer and a first drain layerconfigured to be formed on the active area in a first two-way directionof the gate; and a second source layer and a second drain layerconfigured to be formed on the active area in a second two-way directionof the gate, wherein each of the first source layer, the first drainlayer, and the second drain layer is formed as a first conductive type,and wherein the second source layer is formed as a second conductivetype, wherein the first source layer and the first drain layer aredriven as a metal oxide semiconductor field effect transistor (MOSFET),wherein the second source layer and the second drain layer are driven asa tunneling field effect transistor (TFET).
 3. The semiconductor deviceof claim 2, further comprising: a first source electrode, a first drainelectrode, a second source electrode, and a second drain electrodeconfigured to be electrically connected with the first source layer, thefirst drain layer, the second source layer, and the second drain layer,respectively, wherein each of the first source electrode, the firstdrain electrode, the second source electrode, and the second drainelectrode comprises: a first electrode member configured to beelectrically connected with a corresponding source layer and drain layerformed on the active area and be extended horizontally outward from thesemiconductor device; a first electrode pad configured to be formed on alocation which is not adjacent to the first electrode member; and asecond electrode member configured to be electrically connected with oneend of the first electrode member and one end of the first electrode padand have a width narrower than the first electrode member and the firstelectrode pad.
 4. The semiconductor device of claim 2, wherein theinsulated gate is formed larger in width than the active area where thefirst source layer, the first drain layer, the second source layer, andthe second drain layer are formed.
 5. The semiconductor device of claim2, further comprising: a controller configured to have a first mode forforming a first channel between the first source layer and the firstdrain layer in the active area and have a second mode for forming asecond channel between the second source layer and the second drainlayer in the active area, wherein the first channel and the secondchannel are selectively formed.
 6. A semiconductor test pattern,comprising: a substrate; an active area of a cross form, the active areabeing defined on the substrate; a gate configured to be located on acentral portion of the active area; a gate insulating film configured tobe located between the gate and the central portion of the active area;and four impurity regions formed on the active area outside the gate,wherein any one of the four impurity regions is formed as a firstconductive type, and wherein each of the other impurity regions isformed as a second conductive type, wherein two of the other impurityregions are driven as a metal oxide semiconductor field effecttransistor (MOSFET), wherein the impurity region formed of the firstconductive type and the impurity region formed the second conductivetype are driven as a tunneling field effect transistor (TFET).
 7. Thesemiconductor test pattern of claim 6, wherein the gate is formed largerin width than the active area where the impurity are formed.